Effects of Ag nanoshape and AgGa phase in Ag-Si nanostructure using 2-step etching process

Zhan Shuo Hu, Fei Yi Hung, Shoou Jinn Chang, Kuan Jen Chen, Wen Long Wang, Sheng Joue Young, Tse Pu Chen

研究成果: Article

3 引文 斯高帕斯(Scopus)

摘要

The etching scale was controled by the layball process and a focus ion beam (FIB) was used to investige the dry-wet etching (DWE) mechanism. Increasing the beam current of dry-etching raised the height of nano prominent structures, but deteriorated the interface of Ag/Si film, and even damaged the Ag film because of Ga+ bombardment. Regardless of the Ag nanoshape deposition, the residual Ag films were doped with Ga+ and were sensitive to DWE. After wet-etching, the nano hollow formed and the Ag films sunk. However, AgGa sidewall films formed by the concentration gradient and the oxidative potential and this increased the volume of microporous phases, resulting in a reduction in the depth. Also, 15-30 nm Ag nano-particles were able to enhance the DWE mechanism in the Ag/Si nanostructures.

原文English
頁(從 - 到)758-763
頁數6
期刊Journal of Alloys and Compounds
509
發行號3
DOIs
出版狀態Published - 2011 一月 21

    指紋

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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