Effects of aluminum concentration on the oxidation behaviors of reactively sputtered TiAlN films

Jow Lay Huang, Bor Yuan Shew

研究成果: Article同行評審

45 引文 斯高帕斯(Scopus)

摘要

Polycrystalline TiAlN films were deposited on a substrate of high-speed steel via a radio-frequency-bias reactive-sputtering process. The effects of aluminum concentration (0-60 at.%) on the high-temperature oxidation behavior of TiAlN films were explored by using in situ thermogravimetric analysis and high-temperature X-ray diffractometry. The composition and distribution of the oxidizing layers over TiAlN films were investigated. Results indicated that the oxidation resistance increased as the aluminum concentration increased. The type and location of oxidizing phases also were dependent on the aluminum concentration. Three major oxides - i.e., Al2O3, TiO2, and TiO - were observed. The thickness of the Al2O3 layer increased and the TiO2 gradually changed to TiO as the aluminum content increased. Thermodynamic calculations were compared to experimental observations, and they showed good agreement.

原文English
頁(從 - 到)696-704
頁數9
期刊Journal of the American Ceramic Society
82
發行號3
DOIs
出版狀態Published - 1999

All Science Journal Classification (ASJC) codes

  • 陶瓷和複合材料
  • 材料化學

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