Effects of Average Power-Handling Capability on DC-Sputtering Aluminum Nitride Thin Film on Ceramic Substrate

Tzu Chun Tai, Hung Wei Wu, Yu Ming Lin, Sin Pei Wang, Yeong-Her Wang, Shoou-Jinn Chang

研究成果: Conference contribution

1 引文 (Scopus)

摘要

In this paper, we presented a method to investigate the effects of average power-handling capability (APHC) on dc reactive magnetron sputtering aluminum nitride (AlN) thin film coplanar waveguide (CPW) line fabricated on the ceramic substrate. We discussed the effects of material properties, microwave characteristics, and APHC on the thin-film CPW line. Using the AlN thin-film passivation on the ceramic substrate can effectively improve the thermal conductivity and enhance the APHC of a thin-film CPW line. Measured microwave losses (total of conductor loss α cf) and dielectric loss α df), dielectric constant, and APHC were extracted from S-parameters that were measured up to 10 GHz. This method can be applied in low-temperature cofired ceramic techniques (LTCC).

原文English
主出版物標題Proceedings of the 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018
發行者Institute of Electrical and Electronics Engineers Inc.
頁面1385-1388
頁數4
ISBN(列印)9781538650677
DOIs
出版狀態Published - 2018 八月 17
事件2018 IEEE/MTT-S International Microwave Symposium, IMS 2018 - Philadelphia, United States
持續時間: 2018 六月 102018 六月 15

出版系列

名字IEEE MTT-S International Microwave Symposium Digest
2018-June
ISSN(列印)0149-645X

Other

Other2018 IEEE/MTT-S International Microwave Symposium, IMS 2018
國家United States
城市Philadelphia
期間18-06-1018-06-15

指紋

Aluminum nitride
aluminum nitrides
Sputtering
Telephone lines
Coplanar waveguides
sputtering
direct current
ceramics
Thin films
Substrates
thin films
waveguides
Microwaves
microwaves
Reactive sputtering
Scattering parameters
Dielectric losses
dielectric loss
Passivation
Magnetron sputtering

All Science Journal Classification (ASJC) codes

  • Radiation
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

引用此文

Tai, T. C., Wu, H. W., Lin, Y. M., Wang, S. P., Wang, Y-H., & Chang, S-J. (2018). Effects of Average Power-Handling Capability on DC-Sputtering Aluminum Nitride Thin Film on Ceramic Substrate. 於 Proceedings of the 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018 (頁 1385-1388). [8439568] (IEEE MTT-S International Microwave Symposium Digest; 卷 2018-June). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/MWSYM.2018.8439568
Tai, Tzu Chun ; Wu, Hung Wei ; Lin, Yu Ming ; Wang, Sin Pei ; Wang, Yeong-Her ; Chang, Shoou-Jinn. / Effects of Average Power-Handling Capability on DC-Sputtering Aluminum Nitride Thin Film on Ceramic Substrate. Proceedings of the 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018. Institute of Electrical and Electronics Engineers Inc., 2018. 頁 1385-1388 (IEEE MTT-S International Microwave Symposium Digest).
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abstract = "In this paper, we presented a method to investigate the effects of average power-handling capability (APHC) on dc reactive magnetron sputtering aluminum nitride (AlN) thin film coplanar waveguide (CPW) line fabricated on the ceramic substrate. We discussed the effects of material properties, microwave characteristics, and APHC on the thin-film CPW line. Using the AlN thin-film passivation on the ceramic substrate can effectively improve the thermal conductivity and enhance the APHC of a thin-film CPW line. Measured microwave losses (total of conductor loss α cf) and dielectric loss α df), dielectric constant, and APHC were extracted from S-parameters that were measured up to 10 GHz. This method can be applied in low-temperature cofired ceramic techniques (LTCC).",
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Tai, TC, Wu, HW, Lin, YM, Wang, SP, Wang, Y-H & Chang, S-J 2018, Effects of Average Power-Handling Capability on DC-Sputtering Aluminum Nitride Thin Film on Ceramic Substrate. 於 Proceedings of the 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018., 8439568, IEEE MTT-S International Microwave Symposium Digest, 卷 2018-June, Institute of Electrical and Electronics Engineers Inc., 頁 1385-1388, 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018, Philadelphia, United States, 18-06-10. https://doi.org/10.1109/MWSYM.2018.8439568

Effects of Average Power-Handling Capability on DC-Sputtering Aluminum Nitride Thin Film on Ceramic Substrate. / Tai, Tzu Chun; Wu, Hung Wei; Lin, Yu Ming; Wang, Sin Pei; Wang, Yeong-Her; Chang, Shoou-Jinn.

Proceedings of the 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018. Institute of Electrical and Electronics Engineers Inc., 2018. p. 1385-1388 8439568 (IEEE MTT-S International Microwave Symposium Digest; 卷 2018-June).

研究成果: Conference contribution

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Tai TC, Wu HW, Lin YM, Wang SP, Wang Y-H, Chang S-J. Effects of Average Power-Handling Capability on DC-Sputtering Aluminum Nitride Thin Film on Ceramic Substrate. 於 Proceedings of the 2018 IEEE/MTT-S International Microwave Symposium, IMS 2018. Institute of Electrical and Electronics Engineers Inc. 2018. p. 1385-1388. 8439568. (IEEE MTT-S International Microwave Symposium Digest). https://doi.org/10.1109/MWSYM.2018.8439568