Effects of Mechanical Uniaxial Stress on SiGe HBT Characteristics

Tzu Juei Wang, Hung Wei Chen, Ping Chun Yeh, Chih Hsin Ko, Shoou Jinn Chang, John Yeh, San Lein Wu, Chwan Ying Lee, Wen Chin Lee, Denny D. Tang

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

The impact of mechanical uniaxial stress on the characteristics of SiGe heterojunction bipolar transistors is reported. A four-point bending apparatus was used to apply a uniaxial stress in the range of -200 MPa to +200 MPa. Due to the strain-induced modulation of carrier mobility and energy bandgap, the changes in the collector current (IC), base current (IB), current gain (Β), and breakdown voltage (B VCEO) are related to the strain-polarity. The strain-polarity dependence of the collector current IC was found to oppose that of the breakdown voltage B VCEO, revealing a trade-off between uniaxial compressive and tensile stress. The response of the cutoff frequency under uniaxial stress was also investigated. Unlike the obvious changes of dc characteristics, a minor change in the maximum fT could be found for uniaxial stress levels below 200 MPa. Finally, various components of the transit time are analyzed to assess their contribution to the frequency response.

原文English
頁(從 - 到)H105-H108
期刊Journal of the Electrochemical Society
154
發行號2
DOIs
出版狀態Published - 2007 1月 19

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 可再生能源、永續發展與環境
  • 表面、塗料和薄膜
  • 電化學
  • 材料化學

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