Effects of nanoindentation depth and annealing temperature on microstructural evolution of Au/Cr/Si thin films

Woei-Shyan Lee, Fang Jui Fong

研究成果: Article同行評審

摘要

Nanoindentation tests are performed on as-deposited Au/Cr/Si thin films to a depth of 1000 nm, respectively. The indentations in as-deposited and annealed specimens are examined using transmission electron microscopy (TEM). In the case of the as-deposited specimens, a pop-out feature is observed in the unloading curves and the indentation pressure induces a chain-like island structure and a distorted crystalline structure within the indentation zone. However, in the specimens annealed at temperatures of 250°C and 350°C, respectively, the microstructure of the indentation zone changes from a distorted crystalline structure to an amorphous phase. At an annealing temperature of 450°C, the microstructure contains both amorphous phase and crystalline eutectic phase. The formation of eutectic phase is the result of a higher annealing temperature and a greater indentation deformation.

All Science Journal Classification (ASJC) codes

  • 機械工業

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