Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

Engineering & Materials Science

• Electric properties 67%
• Gas mixtures 28%
• Glass 10%
• Optical properties 78%
• Optoelectronic devices 14%
• Oxide films 78%
• Plasmas 58%
• Reactive sputtering 100%
• Substrates 8%
• Temperature 5%
• Tin oxides 87%

Physics & Astronomy

• electrical properties 46%
• gas mixtures 23%
• glass 7%
• indium oxides 62%
• optical properties 41%
• oxide films 56%
• oxygen 15%
• room temperature 7%
• sputtering 49%
• tin oxides 61%

Chemical Compounds

• Ambient Reaction Temperature 5%
• Deposition Process 11%
• Dioxygen 10%
• Electrical Property 53%
• Gas 11%
• Glass Substrate 10%
• Liquid Film 30%
• Mixture 9%
• Optical Property 46%
• Optoelectronics 9%
• Plasma 39%
• Reactive Sputtering 94%