Effects of process conditions on the synthesis and microstructure of nano-scale metal-containing amorphous carbon thin films

Wan Yu Wu, Jyh Ming Ting

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposition parameters is presented and discussed. The role of carbon energy in the segregation of metal and carbon to form the layer structure is addressed.

原文English
頁(從 - 到)2623-2626
頁數4
期刊Journal of Nanoscience and Nanotechnology
8
發行號5
出版狀態Published - 2008 五月

All Science Journal Classification (ASJC) codes

  • 生物工程
  • 化學 (全部)
  • 生物醫學工程
  • 材料科學(全部)
  • 凝聚態物理學

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