Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposition parameters is presented and discussed. The role of carbon energy in the segregation of metal and carbon to form the layer structure is addressed.
|頁（從 - 到）||2623-2626|
|期刊||Journal of Nanoscience and Nanotechnology|
|出版狀態||Published - 2008 五月|
All Science Journal Classification (ASJC) codes
- 化學 (全部)