Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiAlN films

Bor Yuan Shew, Jow Lay Huang, Ding Fwu Lii

研究成果: Article同行評審

63 引文 斯高帕斯(Scopus)

摘要

The effects of r.f. bias and nitrogen flow on the microstructure and mechanical properties of TiAlN films were investigated. The preferred orientations, grain size, density, adhesive strength and hardness were substantially affected by substrate bias and nitrogen flow rate. The optimized wear resistance occurred 6 ml min-1 higher than the critical N2 flow rate at which a stoichiometric composition could be obtained. This could be related to different kinetics of nitridation of Ti and Al.

原文English
頁(從 - 到)212-219
頁數8
期刊Thin Solid Films
293
發行號1-2
DOIs
出版狀態Published - 1997 一月 30

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 表面和介面
  • 表面、塗料和薄膜
  • 金屬和合金
  • 材料化學

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