Effects of substrate bias on nanocrystal-(Ti,Al)Nx/amorphous-SiNy composite films

Bao Shun Yau, Jow Lay Huang, Ming Chi Kan

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

Nanocrystal-(Ti,Al)Nx/amorphous-SiNy composite films were prepared in a codeposition process under different substrate bias voltages. The effects of substrate bias voltage on the deposition rate, composition, microstructure, and mechanical properties of nanocomposite films were investigated. Results indicated that the films with bias voltages caused resputtering due to the bombardment of high-energy ions on film surface. The resputtering effect had substantial influence on deposition rate, surface morphology, and composition of films. The films with (220) preferred orientation were also observed as the applied substrate bias voltages exceeded 50 V. As the substrate bias voltage increased, the nanocrystallite size increased, lattice strain raised, and the hardness decreased.

原文English
頁(從 - 到)1985-1990
頁數6
期刊Journal of Materials Research
18
發行號8
DOIs
出版狀態Published - 2003 八月

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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