Effects of temperature on surface accumulation and release of silica nanoparticles in an epoxy nanocoating exposed to UV radiation

Chun Chieh Tien, Ching Hsuan Chang, Bernard Haochih Liu, Deborah Stanley, Savelas A. Rabb, Lee L. Yu, Tinh Nguyen, Lipiin Sung

研究成果: Conference contribution

1 引文 斯高帕斯(Scopus)

摘要

Polymer nanocoatings are increasingly used outdoors and in harsh environments. However, because most common polymers degraded by the weathering elements, nanoparticles in polymer nanocoatings may be released into the environments. Such nanoparticle release potentially poses an environmental health and safety risk. This study investigated the effects of temperature on the surface accumulation and release of nanosilica for an epoxy nanocoating exposed to ultraviolet (UV) radiation. Specimens of an amine-cured epoxy containing 5 mass % nanosilica were exposed to 295 nm to 400 nm UV radiation at three temperatures (40°C, 50°C, and 60°C). Surface accumulation and release of nanosilica as a function of UV dose were measured by atomic force microscopy and inductively-coupled plasma optical emission spectrometry, respectively. Nanosilica accumulated rapidly on specimen surface at low UV doses but the rate of accumulation slowed down at high UV doses. Further, the amount of surface accumulation increased with increasing temperature. The mass of Si release increased with increasing temperature for high UV doses; but at low doses, the trend was different: the mass of Si release was greatest at 50°C and smallest at 60°C. Kinetic parameters derived from this study are essential for developing credible models to predict the long term risks of polymer nanocoatings used outdoors.

原文English
主出版物標題Technical Proceedings of the 2014 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2014
發行者Nano Science and Technology Institute
頁面101-104
頁數4
ISBN(列印)9781482258301
出版狀態Published - 2014
事件Nanotechnology 2014: Electronics, Manufacturing, Environment, Energy and Water - 2014 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2014 - Washington, DC, United States
持續時間: 2014 6月 152014 6月 18

出版系列

名字Technical Proceedings of the 2014 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2014
3

Other

OtherNanotechnology 2014: Electronics, Manufacturing, Environment, Energy and Water - 2014 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2014
國家/地區United States
城市Washington, DC
期間14-06-1514-06-18

All Science Journal Classification (ASJC) codes

  • 硬體和架構
  • 電氣與電子工程
  • 電子、光磁材料

指紋

深入研究「Effects of temperature on surface accumulation and release of silica nanoparticles in an epoxy nanocoating exposed to UV radiation」主題。共同形成了獨特的指紋。

引用此