Electrostatic force microscopy measurements of charge trapping behavior of Au nanoparticles embedded in metal-insulator-semiconductor structure

Jung Yup Yang, Joo Hyung Kim, Jun Seok Lee, Seung Ki Min, Hyun Jung Kim, Kang L. Wang, Jin Pyo Hong

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

摘要

Charge trapping properties of electrons and holes in Au nanoparticles embedded in metal-insulator-semiconductor (MIS) on p-type Si (1 0 0) substrates were investigated by electrostatic force microscopy (EFM). The Au nanoparticles were prepared with a unique laser irradiation method and charged by applying a bias voltage between EFM tip and sample. The EFM system was used to image charged areas and to determine quantitatively the amount of stored charge in the Au nanoparticle-inserted MIS structure. In addition, charge trapping characteristics of the samples were carried out with electrical measurements, such as capacitance-voltage and current-voltage measurement for memory characteristics. Finally, the comparison of EFM results with the electrically measured data was done to determine the amount of stored charge in the Au nanoparticle-inserted MIS structure, confirming the usefulness of EFM system for the characterization of nanoparticle-based non-volatile devices.

原文English
頁(從 - 到)1215-1219
頁數5
期刊Ultramicroscopy
108
發行號10
DOIs
出版狀態Published - 2008 九月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 儀器

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