Enhanced dissolution of nanosize CuO in the presence of meso- and micro-pores

Chien Hua Huang, H. Paul Wang, Hsin Liang Huang, Tung Li Hsiung, F. C. Tang

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)


Dissolution of nanosize CuO in the chemical mechanical planarization (CMP) waste water in the presence of micropores (0.74 nm) of Y and mesopores (4 nm) of MCM-41 has been studied by X-ray absorption near edge structure (XANES) spectroscopy in the present work. Since pore openings of Y and MCM-41 are much less than the size of nano-CuO (about 13 nm) in the CMP waste water, CuO is not able to be incorporated directly into the pore systems. At least two reaction paths might be involved in the incorporation process: (1) dissolution of CuO and (2) incorporation of Cu2+ into Y and MCM-41. Experimentally, during the incorporation process, Y might possess equivalent electric fields of 20-50 V/cm for dissolution of nanosize CuO. Interestingly we found that dissolution of nanosize CuO in the CMP waste water was enhanced, for instance, about 65% and 87% of nanosize CuO were incorporated (as Cu2+) and incorporated into Y and MCM-41, respectively.

頁(從 - 到)217-219
期刊Journal of Electron Spectroscopy and Related Phenomena
出版狀態Published - 2007 5月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 輻射
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 光譜
  • 物理與理論化學


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