Enhanced performance of organic light-emitting devices by atmospheric plasma treatment of indium tin oxide surfaces

I. Min Chan, Weng Cheng Cheng, Franklin C. Hong

研究成果: Article同行評審

103 引文 斯高帕斯(Scopus)

摘要

Atmospheric plasma treatment of indium tin oxide (ITO) surfaces has been studied and demonstrated to be the most efficient method in improving the performance of vacuum-deposited double-layer organic light-emitting diode devices, among various plasma treatment methods including low-pressure Ar plasma and low-pressure O2 plasma treatment. Although with a current-voltage characteristic close to low-pressure O2 plasma treatment, the atmospheric plasma treatment exhibits a 40% increase of electroluminescence efficiency. X-ray photoelectron spectroscopy results show that the atmospheric plasma treatment increases the work function and reduces the carbon contamination of ITO surfaces. Our results suggest that atmospheric plasma treatment is a cheaper, more convenient, and more efficient method than low-pressure O2 plasma treatment for improving device performance.

原文English
頁(從 - 到)13-15
頁數3
期刊Applied Physics Letters
80
發行號1
DOIs
出版狀態Published - 2002 1月 7

All Science Journal Classification (ASJC) codes

  • 物理與天文學(雜項)

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