Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing

C. K. Chung; C. H. Tsai; Z. W. Wang

doi:10.1149/2.1051810jes

Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing

研究成果: Article › 同行評審

原文	English
頁（從 - 到）	E498-E503
期刊	Journal of the Electrochemical Society
卷	165
發行號	10
DOIs	https://doi.org/10.1149/2.1051810jes
出版狀態	Published - 2018 1月 1

存取文件

10.1149/2.1051810jes

http://jes.ecsdl.org/lookup/doi/10.1149/2.1051810jes

引用此

@article{ed9235c8cd954356a56c3ffef5b1048a,

title = "Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing",

author = "Chung, {C. K.} and Tsai, {C. H.} and Wang, {Z. W.}",

year = "2018",

month = jan,

day = "1",

doi = "10.1149/2.1051810jes",

language = "English",

volume = "165",

pages = "E498--E503",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

number = "10",

}

TY - JOUR

T1 - Enhancement of Surface Roughness and Growth Morphology of Nanoporous Anodic Alumina from Commercially Aluminum Alloy 1050 Using Two-Step Electrochemical Polishing

AU - Chung, C. K.

AU - Tsai, C. H.

AU - Wang, Z. W.

PY - 2018/1/1

Y1 - 2018/1/1

U2 - 10.1149/2.1051810jes

DO - 10.1149/2.1051810jes

M3 - Article

SN - 0013-4651

VL - 165

SP - E498-E503

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 10

ER -