Plasma-assisted activation (PAA) has been studied in detail to enhance the electrical and optical performance of Mg-doped GaN surface layers. The plasma-assisted activation technique was carried out in a plasma-enhanced chemical vapor deposition (PECVD) system with various ratios of N2 to O2 environments at 400 and 640°C. Plasma energy in our studies was used to decompose the Mg-H complex, and H atoms were absorbed by O 2 gas to form H2O. On the other hand, N2 gas was introduced to compensate for nitrogen vacancies. A hole concentration higher than 2.44 × 1017 cm-3 was determined near the GaN surface and a specific contact resistance of 8.6 × 10-5 Ω·cm2 was achieved, this is better than that of conventional 700°C thermal annealing. A 400°C PAA sample exhibits the same specific contact resistance of 2.1 × 10-4 Ω·cm2 as that of a 700°C thermal annealed sample. Moreover, room temperature-photoluminescence (RT-PL) showed that the 400 and 640°C PAA samples had a stronger intensity compared to that of conventional samples, Peak intensities of RT-PL were centered at 438 nm for all samples. The best electrical and optical properties appeared at a N2 to O 2 ratio of 5 : 3 in our study. A possible explanation is that a self-compensation mechanism is dominant in our plasma-assisted activation.
|頁（從 - 到）||1726-1729|
|期刊||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|出版狀態||Published - 2005 四月|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)