Fabrication and characterization of non-evaporable porous getter films

Chien Cheng Li, Jow-Lay Huang, Ran Jin Lin, Hsiao Kuo Chang, Jyh-Ming Ting

研究成果: Article同行評審

16 引文 斯高帕斯(Scopus)


The porous Ti film getters on (100) silicon substrates were prepared using the glancing angle deposition of dc (direct current) magnetron sputtering method. The main deposition parameters that produce the porous Ti films are the low substrate temperature and high glancing angle. The larger the glancing angle is, the higher the porosity of the Ti films is. The porous films, grown at the glancing angle of 70° and room substrate temperature, are composed of nano-columnar crystalline crystals. The size and inter-distance between the columnar crystals are 70 nm and 30 nm, respectively. The porous Ti films have larger capability to absorb the oxygen than that of dense Ti films and Si substrate. The suitable operation condition of porous Ti film getters was also established.

頁(從 - 到)1351-1355
期刊Surface and Coatings Technology
出版狀態Published - 2005 十一月 21

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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