Fabrication of crack-free metal-semiconductor-metal ultraviolet photodetectors on si (111) substrates based on novel AIN/ALGaN buffer multilayer scheme

Sheng-Po Chang

研究成果: Article同行評審

2 引文 斯高帕斯(Scopus)

摘要

The GaN ultraviolet metal-semiconductor-metal (MSM) photodetectors epitaxially grown on Si (111) and sapphire (0001) substrates were prepared and characterized. By implementing our elaborate AlN/AlGaN buffer multilayer scheme on Si, the maximum responsivity of n--GaN MSM photodetector with TiW transparent electrodes achieved at an incident wavelength of 359 nm was 0.187 A/W, which corresponds to the quantum efficiency of 64.7%. Furthermore, for a given bandwidth of 1 kHz and a given bias of 5 V, the corresponding noise equivalent power (NEP) of aforementioned photodetector was 1.53×10-12 W, which translates to a maximal detectivity (D*) of 1.31×1012 cm-Hz0.5W-1.

原文English
頁(從 - 到)10280-10292
頁數13
期刊International Journal of Electrochemical Science
8
發行號8
出版狀態Published - 2013 十月 2

All Science Journal Classification (ASJC) codes

  • 電化學

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