Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold

Chin Ching Hsu, Yung Chung Lee

研究成果: Conference contribution

8 引文 斯高帕斯(Scopus)

摘要

This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.

原文English
主出版物標題2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
頁面893-897
頁數5
DOIs
出版狀態Published - 2010
事件5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 - Xiamen, China
持續時間: 2010 1月 202010 1月 23

出版系列

名字2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Other

Other5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
國家/地區China
城市Xiamen
期間10-01-2010-01-23

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

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