Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold

Chin Ching Hsu; Yung Chung Lee

doi:10.1109/NEMS.2010.5592124

Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold

Chin Ching Hsu
, Yung Chung Lee

機械工程學系

研究成果: Conference contribution

8 引文斯高帕斯（Scopus）

摘要

This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm²; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm². These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.

原文	English
主出版物標題	2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
頁面	893-897
頁數	5
DOIs	https://doi.org/10.1109/NEMS.2010.5592124
出版狀態	Published - 2010
事件	5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 - Xiamen, China 持續時間: 2010 1月 20 → 2010 1月 23

出版系列

名字	2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Other

Other	5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
國家/地區	China
城市	Xiamen
期間	10-01-20 → 10-01-23

UN SDG

此研究成果有助於以下永續發展目標

SDG 9 產業、創新與基礎設施

All Science Journal Classification (ASJC) codes

控制與系統工程
電氣與電子工程

存取文件

10.1109/NEMS.2010.5592124

其它文件與鏈接

引用此

Hsu, C. C., & Lee, Y. C. (2010). Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold. 於 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 (頁 893-897). 文章 5592124 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010). https://doi.org/10.1109/NEMS.2010.5592124

Hsu, Chin Ching ; Lee, Yung Chung. / Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold. 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. 頁 893-897 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010).

@inproceedings{93649b6a588e4696b6e9fcd5be9de969,

title = "Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold",

abstract = "This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.",

author = "Hsu, \{Chin Ching\} and Lee, \{Yung Chung\}",

year = "2010",

doi = "10.1109/NEMS.2010.5592124",

language = "English",

isbn = "9781424465439",

series = "2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010",

pages = "893--897",

booktitle = "2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010",

note = "5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 ; Conference date: 20-01-2010 Through 23-01-2010",

}

Hsu, CC & Lee, YC 2010, Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold. 於 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010., 5592124, 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, 頁 893-897, 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, Xiamen, China, 10-01-20. https://doi.org/10.1109/NEMS.2010.5592124

Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold. / Hsu, Chin Ching; Lee, Yung Chung.
2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. p. 893-897 5592124 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010).

研究成果: Conference contribution

TY - GEN

T1 - Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold

AU - Hsu, Chin Ching

AU - Lee, Yung Chung

PY - 2010

Y1 - 2010

N2 - This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.

AB - This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2 × 2.5 cm2; (2) line-width of 60 nm, period of 180 nm, area size of 5 × 5 cm2. These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.

UR - https://www.scopus.com/pages/publications/78649236896

UR - https://www.scopus.com/pages/publications/78649236896#tab=citedBy

U2 - 10.1109/NEMS.2010.5592124

DO - 10.1109/NEMS.2010.5592124

M3 - Conference contribution

AN - SCOPUS:78649236896

SN - 9781424465439

T3 - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

SP - 893

EP - 897

BT - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

T2 - 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Y2 - 20 January 2010 through 23 January 2010

ER -

Hsu CC, Lee YC. Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold. 於 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. p. 893-897. 5592124. (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010). doi: 10.1109/NEMS.2010.5592124

Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold

摘要

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Other

UN SDG

All Science Journal Classification (ASJC) codes

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