TY - JOUR
T1 - Fabrication of large-scaled organic light emitting devices on the flexible substrates using low-pressure imprinting lithography
AU - Kao, Po Ching
AU - Chu, Sheng Yuan
AU - Chen, Te Yi
AU - Zhan, Chuan Yi
AU - Hong, Franklin C.
AU - Chang, Chiao Yang
AU - Hsu, Lien Chung
AU - Liao, Wen Chang
AU - Hon, Min Hsiung
N1 - Funding Information:
Manuscript received September 3, 2004. This work was supported by Ministry of Economic Affairs, Taiwan, R.O.C., under Contract 91-EC-17-A-07-S1-0018. The review of this paper was arranged by Editor L. Lunardi. P.-C. Kao, S.-Y. Chu, and T.-Y. Chen are with the Department of Electrical Engineering, National Cheng-Kung University, Tainan, Taiwan, R.O.C. (e-mail: [email protected]). C.-Y. Zhan is with the Institute of Micro-Electro-Mechnical-System Engineering, National Cheng-Kung University, Tainan, Taiwan, R.O.C. F.-C. Hong and C.-Y. Chang are with the Department of Chemical Engineering, National Cheng-Kung University, Tainan, Taiwan, R.O.C. L.-C. Hsu, W.-C. Liao, and M.-H. Hon are with the Department of Materials Science and Engineering, National Cheng-Kung University, Tainan, Taiwan, R.O.C. Digital Object Identifier 10.1109/TED.2005.851811 Fig. 1. Photographs of the F-DLC/Si mold patterned with (a) repeating lines and (b) two seven segments.
PY - 2005/8
Y1 - 2005/8
N2 - This paper demonstrates an approach to fabricate large-scaled (70 × 70 mm) patterned organic light-emitting devices (ITO/CuPc/NPB/ Alq3/LiF/Al) on the flexible polyethylene-terephthalate substrates using low-pressure imprinting lithography. The patterns of the pixel array were defined in crossed-strip style with anode patterned by imprinting techniques followed by wet chemical etching and cathode strips deposited using metal mask. The measured results were: The turn-on voltage of the device was 7.5 V; the luminous efficiency reached 1.13 lm/W (3.04 cd/A) at a luminance of 3.8 cd/m2 and its maximum luminance was 2440 cd/m2, which were comparable to the performances of the devices patterned by conventional photolithography.
AB - This paper demonstrates an approach to fabricate large-scaled (70 × 70 mm) patterned organic light-emitting devices (ITO/CuPc/NPB/ Alq3/LiF/Al) on the flexible polyethylene-terephthalate substrates using low-pressure imprinting lithography. The patterns of the pixel array were defined in crossed-strip style with anode patterned by imprinting techniques followed by wet chemical etching and cathode strips deposited using metal mask. The measured results were: The turn-on voltage of the device was 7.5 V; the luminous efficiency reached 1.13 lm/W (3.04 cd/A) at a luminance of 3.8 cd/m2 and its maximum luminance was 2440 cd/m2, which were comparable to the performances of the devices patterned by conventional photolithography.
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U2 - 10.1109/TED.2005.851811
DO - 10.1109/TED.2005.851811
M3 - Article
AN - SCOPUS:23344433035
SN - 0018-9383
VL - 52
SP - 1722
EP - 1726
JO - IEEE Transactions on Electron Devices
JF - IEEE Transactions on Electron Devices
IS - 8
ER -