Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate

Jhih Nan Yan, Yung-Chun Lee

研究成果: Conference contribution

摘要

This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 μm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.

原文English
主出版物標題2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
頁面36-39
頁數4
DOIs
出版狀態Published - 2012
事件7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 - Kyoto, Japan
持續時間: 2012 三月 52012 三月 8

Other

Other7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
國家Japan
城市Kyoto
期間12-03-0512-03-08

指紋

Photolithography
Sapphire
Masks
Fabrication
Substrates
Metals
Linewidth
Lithography
Light emitting diodes
Printing
Glass
Microstructure
Industry

All Science Journal Classification (ASJC) codes

  • Engineering (miscellaneous)

引用此文

Yan, J. N., & Lee, Y-C. (2012). Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. 於 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 (頁 36-39). [6196717] https://doi.org/10.1109/NEMS.2012.6196717
Yan, Jhih Nan ; Lee, Yung-Chun. / Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012. 2012. 頁 36-39
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Yan, JN & Lee, Y-C 2012, Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. 於 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012., 6196717, 頁 36-39, 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, 12-03-05. https://doi.org/10.1109/NEMS.2012.6196717

Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. / Yan, Jhih Nan; Lee, Yung-Chun.

2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012. 2012. p. 36-39 6196717.

研究成果: Conference contribution

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Yan JN, Lee Y-C. Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. 於 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012. 2012. p. 36-39. 6196717 https://doi.org/10.1109/NEMS.2012.6196717