摘要
Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.
原文 | English |
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頁(從 - 到) | 307-312 |
頁數 | 6 |
期刊 | IEEJ Transactions on Electrical and Electronic Engineering |
卷 | 2 |
發行號 | 3 |
DOIs | |
出版狀態 | Published - 2007 5月 |
All Science Journal Classification (ASJC) codes
- 電氣與電子工程