Fabrication of metallic nanopatterns using the vacuum type UV-NIL equipment

Makoto Fukuhara, Jun Mizuno, Mikiko Saito, Takayuki Homma, Shuichi Shoji

研究成果: Article同行評審

16 引文 斯高帕斯(Scopus)

摘要

Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.

原文English
頁(從 - 到)307-312
頁數6
期刊IEEJ Transactions on Electrical and Electronic Engineering
2
發行號3
DOIs
出版狀態Published - 2007 5月

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程

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