Fabrication of seamless patterns onto metal rollers by photolithography

Hong Wei Chen, Yung Chun Lee, Fei Bin Hsiao

研究成果: Conference contribution

7 引文 斯高帕斯(Scopus)

摘要

This paper develops a novel method to fabricate seamless and complicated patterns of microstructures onto the cylindrical surface of a metal roller. This patterned metal roller can then serve as a roller mold in roll-to-roll (R2R) continuous roller imprinting of microstructures at low-cost, high-speed, and large-area. The first step towards fabricating a seamless roller mold is a pneumatically driven and self-spinning coating method and system which can uniformly spin-coat a smooth thin photo-resist (PR) layer on the cylindrical surface of a roller. After the PR coating, a UV exposure system which consists of a UV light source, a mask, and a rotary mechanism is setup up so that the PR coating is exposed in a step-and-rotate manner. Finally the exposed PR on the surface of roller can be developed and then the metal roller can be chemically etched, similar to standard process in conventional photolithography. That completes the fabrication of seamless roller molds. A number of seamless roller molds with different patterns of microstructures have been successfully fabricated. Potential developments and possible applications are under investigation.

原文English
主出版物標題2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
頁面887-892
頁數6
DOIs
出版狀態Published - 2010
事件5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 - Xiamen, China
持續時間: 2010 1月 202010 1月 23

出版系列

名字2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Other

Other5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
國家/地區China
城市Xiamen
期間10-01-2010-01-23

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

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