Forced diffusion via electrically induced crystallization for fabricating ZnO-Ti-Si structures

研究成果: Article

1 引文 斯高帕斯(Scopus)

摘要

Electrically induced crystallization (EIC) is a recently developed process for material modification. This study is applied to EIC to fabricate ZnO-Ti-Si multi-layer structures of various thicknesses to dope Ti into ZnO thin film and to form TiSix intermetallic compound (IMC) in a single step. The IMC layer was confirmed using transmission electron microscopy images. The Ti layer thickness was more than 40 nm, which enhanced electron transmission and decreased the total electrical resistance in the structure. Finally, the diffusion mechanisms of EIC and the annealing process were investigated. This study shows that the EIC process has potential for industrial applications.

原文English
頁(從 - 到)425-430
頁數6
期刊Materials Research Bulletin
59
DOIs
出版狀態Published - 2014 一月 1

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

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