Formation of Methyl Radicals during the Oxidative Addition of Iodomethane to a Single-Crystal Copper Surface

Jong Liang Lin, Brian E. Bent

研究成果: Article同行評審

65 引文 斯高帕斯(Scopus)

摘要

Submonolayer quantities of CH3I have been adsorbed onto an atomically-clean Cu(111) single-crystal surface under ultra-high-vacuum conditions. At 110 K, the molecules remain intact. Upon heating the surface, the carbon-iodine bond dissociates at 140 K to produce adsorbed methyl groups (which have been identified by surface vibrational spectroscopy) and gas-phase methyl radicals (which are detected by mass spectrometry). The activation energy for these processes is ∼8.5 kcal/mol. The observation of methyl radicals suggests that the surface reaction is analogous to the oxidative addition of alkyl iodides to metal compounds by atom-transfer or electron-transfer mechanisms. The thermodynamics and kinetics of both mechanisms are discussed in the context of the Cu(111) results.

原文English
頁(從 - 到)2849-2853
頁數5
期刊Journal of the American Chemical Society
115
發行號7
DOIs
出版狀態Published - 1993 4月 1

All Science Journal Classification (ASJC) codes

  • 催化
  • 一般化學
  • 生物化學
  • 膠體和表面化學

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