Forming photo-spacer and bump in one photolithography process by using a gray-tone mask

Ching Yih Chen, Chih Ming Lai, Chia-Rong Sheu, Kang Hung Liu

研究成果: Conference article

摘要

An new photo-spacer and bump formation in one-shot process has been developed by using a gray-tone mask. In this design, two to three kind of photo-resist height can be formed in one photolithography step. Bump with sapcer, concave shaped bump, or anti-bump can then be formed with different mask pattern design. Moreover, this new process can be readily applied to top ITO type LCD, such as LTPs TFT-LCD. The effect of the mask pattern can be simulated first to check the exposure result. The optimized results are also reported.

原文English
頁(從 - 到)569-572
頁數4
期刊SID Conference Record of the International Display Research Conference
出版狀態Published - 2001 十二月 1
事件Asia Display/IDW 2001 - Nagoya, Japan
持續時間: 2002 十月 162002 十月 19

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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