Free carrier absorption in P-type epitaxial Si and GaAs films for far-infrared detection

  • A. G.U. Perera
  • , W. Z. Shen
  • , M. O. Tanner
  • , K. L. Wang
  • , W. Schaff

研究成果: Conference article同行評審

摘要

We report the investigation of free-carrier absorption characteristics for epitaxially grown p-type thin films in the far-infrared region (50 approx. 200 μm), where homojunction interfacial workfunction internal photoemission (HIWIP) detectors are employed. Five Si and three GaAs thin films were grown by MBE over a range of carrier concentrations, and the experimental absorption data were compared with calculated results. The free-hole absorption is found to be almost independent of the wavelength. A linear regression relationship between the absorption coefficient and the carrier concentration, in agreement with theory, has been obtained and employed to calculate the photon absorption probability in HIWIP detectors. The detector responsivity follows the quantum efficiency predicted by concentration dependence of the free carrier absorption coefficient.

原文English
頁(從 - 到)199-204
頁數6
期刊Materials Research Society Symposium - Proceedings
484
DOIs
出版狀態Published - 1997
事件Proceedings of the 1997 MRS Fall Symposium - Boston, MA, USA
持續時間: 1997 11月 301997 12月 4

All Science Journal Classification (ASJC) codes

  • 一般材料科學
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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