Frequency and noise performances of photoelectrochemically etched and oxidized gate-recessed AlGaN/GaN MOS-HEMTs

Ya Lan Chiou, Chi Sen Lee, Ching Ting Lee

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

指紋

深入研究「Frequency and noise performances of photoelectrochemically etched and oxidized gate-recessed AlGaN/GaN MOS-HEMTs」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds