Gas cluster ion beam application to porous low-k dielectrics

John Hautala; Greg Book; Brian White; Chris Doughty; Dung Ching Perng; Terukazu Kokubo

Gas cluster ion beam application to porous low-k dielectrics

John Hautala
, Greg Book
, Brian White
, Chris Doughty
, Dung Ching Perng
, Terukazu Kokubo

電機工程學系

研究成果: Conference article › 同行評審

3 引文斯高帕斯（Scopus）

摘要

Applications of gas cluster ion beams (GCIB) to sealing of pores in low-k and ultra-low-k materials are reported. Application of GCIB to porous low-k materials results in the formation of a very thin dense surface layer with optical properties similar to SiO ₂. This layer forms an effective metal diffusion barrier to TiSiN chemical vapor deposition. Use of an oxygen-containing cluster beam allows for simultaneous photoresist ashing and pore sealing.

原文	English
頁（從 - 到）	461-467
頁數	7
期刊	Advanced Metallization Conference (AMC)
出版狀態	Published - 2003
事件	Advanced Metallization Conference 2003, AMC 2003 - Montreal, Que., Canada 持續時間: 2003 10月 21 → 2003 10月 23

All Science Journal Classification (ASJC) codes

一般化學工程

其它文件與鏈接

引用此

@article{91c1de7d59a3443b8bb11482ca580f73,

title = "Gas cluster ion beam application to porous low-k dielectrics",

abstract = "Applications of gas cluster ion beams (GCIB) to sealing of pores in low-k and ultra-low-k materials are reported. Application of GCIB to porous low-k materials results in the formation of a very thin dense surface layer with optical properties similar to SiO 2. This layer forms an effective metal diffusion barrier to TiSiN chemical vapor deposition. Use of an oxygen-containing cluster beam allows for simultaneous photoresist ashing and pore sealing.",

author = "John Hautala and Greg Book and Brian White and Chris Doughty and Perng, \{Dung Ching\} and Terukazu Kokubo",

year = "2003",

language = "English",

pages = "461--467",

journal = "Advanced Metallization Conference (AMC)",

issn = "1540-1766",

publisher = "Materials Research Society",

note = "Advanced Metallization Conference 2003, AMC 2003 ; Conference date: 21-10-2003 Through 23-10-2003",

}

TY - JOUR

T1 - Gas cluster ion beam application to porous low-k dielectrics

AU - Hautala, John

AU - Book, Greg

AU - White, Brian

AU - Doughty, Chris

AU - Perng, Dung Ching

AU - Kokubo, Terukazu

PY - 2003

Y1 - 2003

N2 - Applications of gas cluster ion beams (GCIB) to sealing of pores in low-k and ultra-low-k materials are reported. Application of GCIB to porous low-k materials results in the formation of a very thin dense surface layer with optical properties similar to SiO 2. This layer forms an effective metal diffusion barrier to TiSiN chemical vapor deposition. Use of an oxygen-containing cluster beam allows for simultaneous photoresist ashing and pore sealing.

AB - Applications of gas cluster ion beams (GCIB) to sealing of pores in low-k and ultra-low-k materials are reported. Application of GCIB to porous low-k materials results in the formation of a very thin dense surface layer with optical properties similar to SiO 2. This layer forms an effective metal diffusion barrier to TiSiN chemical vapor deposition. Use of an oxygen-containing cluster beam allows for simultaneous photoresist ashing and pore sealing.

UR - https://www.scopus.com/pages/publications/23844500653

UR - https://www.scopus.com/pages/publications/23844500653#tab=citedBy

M3 - Conference article

AN - SCOPUS:23844500653

SN - 1540-1766

SP - 461

EP - 467

JO - Advanced Metallization Conference (AMC)

JF - Advanced Metallization Conference (AMC)

T2 - Advanced Metallization Conference 2003, AMC 2003

Y2 - 21 October 2003 through 23 October 2003

ER -

Gas cluster ion beam application to porous low-k dielectrics

摘要

All Science Journal Classification (ASJC) codes

其它文件與鏈接

指紋

引用此