Graphene oxide-based micropatterns via highthroughput multiphoton-induced reduction and ablation

Yi Cheng Li, Te Fu Yeh, Hsin Chieh Huang, Hsin Yu Chang, Chun Yu Lin, Li Chung Cheng, Chia Yuan Chang, Hsisheng Teng, Shean Jen Chen

研究成果: Article同行評審

13 引文 斯高帕斯(Scopus)

摘要

In this study, a developed temporal focusing-based femtosecond laser system provides high-throughput multiphoton-induced reduction and ablation of graphene oxide (GO) films. Integrated with a digital micromirror device to locally control the laser pulse numbers, GO-based micropatterns can be quickly achieved instantly. Furthermore, the degree of reduction and ablation can be precisely adjusted via controlling the laser wavelength, power, and pulse number. Compared to point-by-point scanning laser direct writing, this approach offers a high-throughput and multiple-function approach to accomplish a large area of micro-scale patterns on GO films. The high-throughput micro patterning of GO via the temporal focusing based fem to second laser system fulfills the requirement of mass production for GO-based applications in microelectronic devices.

原文English
頁(從 - 到)19726-19734
頁數9
期刊Optics Express
22
發行號16
DOIs
出版狀態Published - 2014 8月 11

All Science Journal Classification (ASJC) codes

  • 原子與分子物理與光學

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