摘要
We present results of a stochastic kinetic simulation of the segregation of Al and Ga during the mobility-enhanced epitaxial deposition on the As face of a stepped (100) GaAs surface.
原文 | English |
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頁(從 - 到) | 2683-2685 |
頁數 | 3 |
期刊 | Applied Physics Letters |
卷 | 57 |
發行號 | 25 |
DOIs | |
出版狀態 | Published - 1990 |
All Science Journal Classification (ASJC) codes
- 物理與天文學(雜項)