摘要
The growth of InGaN self-assembled quantum dots (QD) using metallorganic chemical vapor deposition (MOCVD) method was investigated. The InGaN QDs were successfully fabricated with a typical lateral size of 25 nm and average heigth of 4.1 nm, with a 12 s growth interruption. The fabrication of InGaN metal-semiconductor-metal (MSM) photodiodes with and without QDs was also presented. The QD photodiodes with lower dark current was found to be able to operate in the normal incidence mode and exhibited a stronger photoresponse.
原文 | English |
---|---|
頁(從 - 到) | 792-795 |
頁數 | 4 |
期刊 | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
卷 | 22 |
發行號 | 3 |
DOIs | |
出版狀態 | Published - 2004 5月 |
All Science Journal Classification (ASJC) codes
- 凝聚態物理學
- 表面和介面
- 表面、塗料和薄膜