Growth of SiC nanoparticles in C/Si multilayers using annealing

C. K. Chung, Bo-Hsiung Wu, T. R. Shih

研究成果: Conference contribution

摘要

Conventional nanoparticles were directly synthesized in single film by PVD or CVD process. In this paper, we proposed a novel approach to the growth of SiC nano-particles (np-SiC) by thermal annealing of C/Si multilayers deposited on single crystalline Si (100) substrates using ion beam sputtering system (IBS). The deposition of C/Si multilayers was performed at room temperature under ultra high vacuum at a base pressure of 10-7-10-8Pa and then post high vacuum annealing at 500- 900 °C at 10-4Pa. The np-SiC in C/Si multilayers were examined by scanning electron microscope (SEM) for particle characterization, and grazing incidence X-ray diffractometer (GIXRD) for phase identification. The size distribution and geometrical arrangement of np-SiC strongly depend on the thermal annealing temperature. The higher the annealing temperature, the more the nanoparticle size and density. Owing to the high surface energy, SiC nanoparticles, instead of film, are preferred to form on the surface in order to reduce the surface energy of film during annealing. After vacuum annealing at 900 °C for 1.0 hr, the size and density of np-SiC are about 300-600 nm in diameter and 1.37 × 108cm-2, respectively. The growth of np-SiC is attributed to the thermal annealing induced surface energy variation between Si and C reaction in thin C/Si multilayers.

原文English
主出版物標題Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS
發行者IEEE Computer Society
頁面915-918
頁數4
ISBN(列印)1424401402, 9781424401406
DOIs
出版狀態Published - 2006 一月 1
事件1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS - Zhuhai, China
持續時間: 2006 一月 182006 一月 21

出版系列

名字Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS

Other

Other1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS
國家China
城市Zhuhai
期間06-01-1806-01-21

All Science Journal Classification (ASJC) codes

  • Biotechnology
  • Materials Science (miscellaneous)

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