摘要
We report the growth and characterization of ZnSe films prepared on ZnO-Si(1 1 1) templates. It was found that the as-deposited ZnSe films were highly oriented with zinc blende structure and a preferred (1 1 1) crystal orientation. It was also found that quality of ZnSe epitaxial layers depends on the ZnO annealing conditions. With a 1h 1000 °C ZnO annealing, we could achieve a ZnSe/ZnO-Si(1 1 1) sample with a 53meV room temperature (room temperature) photoluminescence (PL) full-width-half-maximum (FWHM).
| 原文 | English |
|---|---|
| 頁(從 - 到) | 84-88 |
| 頁數 | 5 |
| 期刊 | Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
| 卷 | 107 |
| 發行號 | 1 |
| DOIs | |
| 出版狀態 | Published - 2004 2月 25 |
All Science Journal Classification (ASJC) codes
- 一般材料科學
- 凝聚態物理學
- 材料力學
- 機械工業
指紋
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