High-mobility ingazno tfts using atmospheric pressure plasma jet technique and 248-nm excimer laser annealing

Chien Hung Wu, Hau Yuan Huang, Shui Jinn Wang, Kow Ming Chang

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

摘要

With the advantages of low apparatus cost, better suitability for large-scale fabrication, and low thermal budget, the nonvacuum atmospheric pressure plasma jet technique and 248-nm excimer laser annealing were employed for the fabrication of indium gallium zinc oxide (InGaZnO) thin-film transistors. Devices with a 150-mJ/cm2 laser demonstrated excellent electrical characteristics with reduced OFF-current, including a high channel mobility of 21.2 cm2/V-s, the ON-OFF current ratio of 7×105, and a subthreshold swing of 0.48 V/decade. The improvements are attributed to the increase of oxygen vacancies in the InGaZnO channel and the reduction of traps at the ZrO2/InGaZnO interface and InGaZnO bulk.

原文English
文章編號6908043
頁(從 - 到)1031-1033
頁數3
期刊IEEE Electron Device Letters
35
發行號10
DOIs
出版狀態Published - 2014 10月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 電氣與電子工程

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