摘要
We have grown single crystalline InN films on sapphire substrate using metal-organic vapor phase epitaxy (MOVPE). Electron mobility exceeding 1100 cm2/V sec was obtained for the as-grown films, with a donor concentration of 1-2 × 1019 cm-3. The observed mobility was higher than other reports using the MOVPE technique, and was comparable to the best results with similar carrier concentration using molecular beam epitaxy. Photoluminescence measurement showed a broad emission near 1.6 μm, indicating a likely narrow bandgap similar to many recent reports on InN. X-ray photoelectron spectroscopic analysis revealed little oxygen in the InN films grown.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 2559-2563 |
| 頁數 | 5 |
| 期刊 | Physica Status Solidi C: Conferences |
| 卷 | 1 |
| 發行號 | 10 |
| DOIs | |
| 出版狀態 | Published - 2004 |
All Science Journal Classification (ASJC) codes
- 凝聚態物理學
指紋
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