High-performance a-igzo thin-film transistor using Ta2O 5 gate dielectric

C. J. Chiu, S. P. Chang, S. J. Chang

研究成果: Article同行評審

166 引文 斯高帕斯(Scopus)

摘要

In this letter, we report the fabrication of an amorphous indium gallium zinc oxide (a-IGZO) thin-film transistor with a high-κ dielectric layer on a glass substrate. The room-temperature-deposited a-IGZO channel with Ta 2O5 exhibits the following operating characteristics: a threshold voltage of 0.25 V, a drainsource current on/off ratio of 10 5, a subthreshold gate voltage swing of 0.61 V/decade, and a high field-effect mobility of 61.5 cm2/Vċs; these characteristics make it suitable for use as a switching transistor and in low-power applications.

原文English
文章編號5570921
頁(從 - 到)1245-1247
頁數3
期刊IEEE Electron Device Letters
31
發行號11
DOIs
出版狀態Published - 2010 11月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 電氣與電子工程

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