High-performance amorphous indium-gallium-zinc oxide thin-film transistors with polymer gate dielectric

C. J. Chiu, S. P. Chang, S. J. Chang

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

摘要

The fabrication of amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) with a spin-coated polymer gate dielectric on a glass substrate is reported. The interface state density at the poly(4-vinylphenol)/a- IGZO interface is only around 4.05 × 10 11 cm - 2. The TFTs' threshold voltage, subthreshold swing, on-off current ratio, and carrier mobility are 2.6 V, 1.3 V/decade, 1 × 10 5, and 21.8 cm 2/V s, respectively. These characteristics indicate that the TFTs are suitable for use as nonvolatile memory devices and in flexible electronic applications.

原文English
頁(從 - 到)5455-5458
頁數4
期刊Thin Solid Films
520
發行號16
DOIs
出版狀態Published - 2012 6月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 表面和介面
  • 表面、塗料和薄膜
  • 金屬和合金
  • 材料化學

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