High-resolution photoemission study of UNi2Al3 and URu2Si2

S. H. Yang, H. Kumigashira, T. Yokoya, A. Chainani, N. Sato, T. Komatsubara, S. J. Oh, T. Takahashi

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)


High-resolution low-temperature photoemission spectroscopy was performed for UNi2Al3 and URu2Si2 to study the nature of 5f electrons in U-based heavy fermion materials. Photoemission spectra of both compounds have a sharp peak at EF and a large broad peak around 2 eV, while only UNi2Al3 exhibits an additional small broad feature at 0.6 eV. The two features in the vicinity of EF (the EF-peak and the small structure at 0.6 eV) were found to have a dominant U 5f character. Comparison with the band structure calculations and experimental results on UPd2Al3 suggests that the EF-peak is ascribed to itinerant U 5f electrons while the following broad feature at 0.6 eV represents localized f electrons.

頁(從 - 到)143-145
期刊Journal of Electron Spectroscopy and Related Phenomena
出版狀態Published - 1996 五月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 輻射
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 光譜
  • 物理與理論化學


深入研究「High-resolution photoemission study of UNi<sub>2</sub>Al<sub>3</sub> and URu<sub>2</sub>Si<sub>2</sub>」主題。共同形成了獨特的指紋。