High temperature characteristics of ZnO-based MOS-FETs with photochemical vapor deposition SiO2 gate oxide

S. J. Young, S. J. Chang, L. W. Ji, H. Hung, S. M. Wang, K. W. Liu, K. J. Chen, Z. S. Hu

研究成果: Conference contribution

原文English
主出版物標題2009 International Semiconductor Device Research Symposium, ISDRS '09
DOIs
出版狀態Published - 2009
事件2009 International Semiconductor Device Research Symposium, ISDRS '09 - College Park, MD, United States
持續時間: 2009 12月 92009 12月 11

出版系列

名字2009 International Semiconductor Device Research Symposium, ISDRS '09

Other

Other2009 International Semiconductor Device Research Symposium, ISDRS '09
國家/地區United States
城市College Park, MD
期間09-12-0909-12-11

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程
  • 電子、光磁材料

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