High-temperature stability of heteroepitaxial Ir-silicide/SiGe layers co-deposited on Si(100) under ultra-high vacuum

C. K. Chung, J. Hwang

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深入研究「High-temperature stability of heteroepitaxial Ir-silicide/SiGe layers co-deposited on Si(100) under ultra-high vacuum」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy