Hydrogen sensing performance of a nickel oxide (NiO) thin film-based device

Po Cheng Chou, Huey Ing Chen, I. Ping Liu, Chun Chia Chen, Jian Kai Liou, Kai Siang Hsu, Wen Chau Liu

研究成果: Article同行評審

36 引文 斯高帕斯(Scopus)


An interesting nickel oxide (NiO) thin film-based hydrogen sensor device, prepared by a low-powered (50 W) radio-frequency (RF) sputtering process, is studied and demonstrated. The studied device shows improved performance including a very high hydrogen sensing response ratio (416 (ΔR/R)), an extremely low detecting limit (<50 ppm H2/air), a high sensing response speed (7 s), a lower operating temperature (350 °C) and a widespread sensing range of hydrogen concentration (50-10,000 ppm H2/air). In addition, the device demonstrates benefits of low cost, easy fabrication and chemical stability. Based on these advantages, therefore, the studied NiO thin film sensor device shows promise for high-performance hydrogen sensing applications.

頁(從 - 到)729-734
期刊International Journal of Hydrogen Energy
出版狀態Published - 2015 1月 5

All Science Journal Classification (ASJC) codes

  • 可再生能源、永續發展與環境
  • 燃料技術
  • 凝聚態物理學
  • 能源工程與電力技術


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