Impact of gate work-function on memory characteristics in Al 2O 3/HfO x/Al 2O 3/graphene charge-trap memory devices

Sejoon Lee, Emil B. Song, Sungmin Kim, David H. Seo, Sunae Seo, Tae Won Kang, Kang L. Wang

研究成果: Article同行評審

44 引文 斯高帕斯(Scopus)

指紋

深入研究「Impact of gate work-function on memory characteristics in Al <sub>2</sub>O <sub>3</sub>/HfO <sub>x</sub>/Al <sub>2</sub>O <sub>3</sub>/graphene charge-trap memory devices」主題。共同形成了獨特的指紋。

Physics & Astronomy