Implementation of a carbon doped low-k material for 0.18 micron technology

Wei Jen Hsia, Wilbur Catabay, Michael Lu, D. C. Perng

研究成果: Article同行評審

指紋

深入研究「Implementation of a carbon doped low-k material for 0.18 micron technology」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds