摘要
A GaN-based light-emitting diode (LED) with a direct-Ohmic contact structure, formed by an indium-tin-oxide (ITO) transparent film and Au thermal-diffused and removed layer, is studied. By depositing an Au metallic film on the Mg-doped GaN layer followed by thermal annealing and removed processes, an ITO direct-Ohmic contact at p-GaN/ITO interface is formed. An enhanced light output power of 18.0% is also found at this condition. This is mainly attributed to the larger and more uniform light-emission area resulted from the improved current spreading capability by the use of an ITO direct-Ohmic contact structure.
原文 | English |
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頁(從 - 到) | 14662-14670 |
頁數 | 9 |
期刊 | Optics Express |
卷 | 19 |
發行號 | 15 |
DOIs | |
出版狀態 | Published - 2011 7月 18 |
All Science Journal Classification (ASJC) codes
- 原子與分子物理與光學