Importance of data quality in virtual metrology

Yi Ting Huang, Fan Tien Cheng, Yeh Tung Chen

研究成果: Conference contribution

17 引文 斯高帕斯(Scopus)

摘要

The purpose of VM is to enable the manufacturers to conjecture the wafer quality and deduce the causes of defects without performing physical metrology. VM requires a large amount of sensor data retrieved from production tools. However, inappropriateness and instability of the data collection system, which leads to incorrectness, fragment and asynchrony of data collected, may lead to inaccurate conjecture results. Hence, not only precision of the VM conjecture module but also quality of the collected data are essential to ensure accurate and stable VM results for improving production yield. In this work, the importance of data quality to VM is investigated. The data quality mechanism is proposed for data characteristic analysis, data anomaly detection, data cleaning, data normalization, and data reduction. Besides, the equipment of semiconductor chemical vapor deposition (CVD) is adopted as a practical example to illustrate the significance of data quality mechanism, and further verify feasibility and effectiveness of VM.

原文English
主出版物標題IECON 2006 - 32nd Annual Conference on IEEE Industrial Electronics
頁面3727-3732
頁數6
DOIs
出版狀態Published - 2006
事件IECON 2006 - 32nd Annual Conference on IEEE Industrial Electronics - Paris, France
持續時間: 2006 11月 62006 11月 10

出版系列

名字IECON Proceedings (Industrial Electronics Conference)

Other

OtherIECON 2006 - 32nd Annual Conference on IEEE Industrial Electronics
國家/地區France
城市Paris
期間06-11-0606-11-10

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

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