Improved high-temperature characteristics of a symmetrically graded AlGaAs/InxGa1-xAs/AlGaAs pHEMT

Jun Chin Huang, Wei-Chou Hsu, Ching Sung Lee, Wei Chen Chang, Dong Hai Huang

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

摘要

This work investigates the superior high-temperature and high-linearity characteristics of a double δ-doped AlGaAs/InxGa 1-xAs/AlGaAs pseudomorphic high electron mobility transistor (pHEMT) with a symmetrically linearly graded InxGa1-xAs channel and a wide energy gap AlGaAs barrier. Distinguished high-temperature device characteristics are presented, including an extrinsic transconductance (g m,max) of 182 (223) mS mm-1, a drain-source saturation current density (IDSS) of 428 (524) mA mm-1, an output conductance of 0.334 (0.352) mS mm-1, a gate-voltage swing (GVS) of 1.45 (1.5) V, a voltage gain (Av) of 505 (658) and a reverse breakdown voltage (BVGD) of -24.1 (-31.2) V at 500 (300) K, respectively, with gate dimensions of 0.65 × 200 νm2. In addition, the device demonstrates a superior stable thermal threshold coefficient (∂Vth/∂T) of -0.55 mV K-1, a thermal GVS coefficient (∂GVS/∂T) of -0.25 mV K-1 and a wide gate-bias range of 1.25 V for a unity-gain cut-off frequency (ft) of over 20 GHz. Consequently, the proposed device shows good potential for high-temperature and high-linearity circuit applications.

原文English
文章編號029
頁(從 - 到)1675-1680
頁數6
期刊Semiconductor Science and Technology
21
發行號12
DOIs
出版狀態Published - 2006 12月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電氣與電子工程
  • 材料化學

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