Improved stability of Co-sputtered Ti-IGZO Channel Thin-Film Transistors with Zr0.85Si0.15O2 Gate Dielectric

Yen Hao-Ping , Shui-Jinn Wang, Chien Hsiung Hung, Nai Sheng Wu, Ying Chi Hung, Cheng-Xiu Lin, Zhi-Kai Zhuang, Ching Yi Chen, Chien Hung Wu

研究成果: Conference contribution

原文English
主出版物標題2017 International Conference on Solid State Devices and Materials (SSDM’17)
出版地Sendai, Japan
出版狀態Published - 2017 九月 19

引用此

Hao-Ping , Y., Wang, S-J., Hung, C. H., Wu, N. S., Hung, Y. C., Lin, C-X., Zhuang, Z-K., Chen, C. Y., & Wu, C. H. (2017). Improved stability of Co-sputtered Ti-IGZO Channel Thin-Film Transistors with Zr0.85Si0.15O2 Gate Dielectric. 於 2017 International Conference on Solid State Devices and Materials (SSDM’17)