Improvement of electrical and reliability properties of tantalum pentoxide by high-density plasma (HDP) annealing in N2O

S. J. Chang, J. S. Lee, J. F. Chen, S. C. Sun, C. H. Liu, U. H. Liaw, B. R. Huang

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6 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds