In-situ post-annealing technique for improving piezoelectricity and ferroelectricity of Li-doped ZnO thin films prepared by radio frequency magnetron sputtering system

Chun Cheng Lin, Chia Chiang Chang, Chin Jyi Wu, Zong Liang Tseng, Jian Fu Tang, Sheng Yuan Chu, Yi Chun Chen, Xiaoding Qi

研究成果: Article同行評審

13 引文 斯高帕斯(Scopus)

摘要

Li-doped zinc oxide (L0.03Z0.97O) thin films are deposited onto Pt/Ti/SiO2/Si substrates via the radio frequency magnetron sputtering method. The structure evolution with annealing temperature of the predominantly (002)-oriented Li-doped ZnO (LZO) films after in-situ post-annealing process is determined. The largest values of the piezoelectric coefficient (d33) and the remnant polarization (Pr) (22.85 pm/V and 0.655 μC/cm2, respectively) are obtained for LZO films post-annealed at 600 °C, which can be attributed to the predominant (002)-oriented crystalline structure, the release of intrinsic residual compressive stress, and less non-lattice oxygen.

原文English
文章編號102107
期刊Applied Physics Letters
102
發行號10
DOIs
出版狀態Published - 2013 3月 11

All Science Journal Classification (ASJC) codes

  • 物理與天文學(雜項)

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